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What is the effect on threshold voltage of a mos capacitor on increasing substrate doping concentration?
The threshold voltage will be increased (in case of an N-Mos), because the charge in the depletion region formed under the channel will be more (high density) and hence gate voltage has to overcome this charge for strong inversion. Vt = (work function difference of gate and substrate) + 2*(substrate Fermi voltage) + (Qd/Cox) Where, Qd = charge in Depletion region in Coulomb Cox = Oxide capacitance
What is flash or solid state storage?
A type of MOS (Metal Oxide Semiconductor) capacitor based EEPROM (Electrically Erasable Programable Read Only Memory) with very fast (aka flash) block erase capability. This very fast block erase capability facilitates its ability to emulate a harddisk, but without having any moving parts.
CMOS is an acronym for what?
CMOS stands for Complimentary Metal Oxide Semiconductor. CMOS is a technology for constructing integrated circuits. It is widely used in Microprocessors, Micro Controllers, Static RAM. It is also used in Analog circuits such as image sensors. CMOS was patented in 1967 by Frank Wanlass. CMOS is sometimes referred as COS-MOS i.e complementary-symmetry metal-oxide-semiconductor.
What make mos an active device?
MOSFETs
What is the mission of the MOS marking team?
the mos team layouts of the minimuim operating strip, establishes travel routes, and ids crater size and location
