- centrifuging - gaseous diffusion - thermal diffusion - electromagnetic separation - expansion from nozzles - laser enrichment - ion exchangers - distillation
An n-type semiconductor is formed by doping a pure semiconductor (silicon or germanium, for example) with atoms of a Group V element, typically phosphorus or arsenic. The dopant may be introduced when the crystal is formed or later, by diffusion or ion implantation.
Annealing is the heat treatment given to a semiconductor material. Annealing is the process by which the lattice damages are repaired. The damages are generally done by ion implantation on semiconductor material.
An electric current goes through an electric circuit, if it is closed.
ions that plants need for supprt and growth
Diffusion is the mixing of two materials by the natural movement of the particles.Implantation is a forced action for the introduction of an item (or partcle) in other object (material).
Ion implantation allows for precise control of dopant concentration and depth, resulting in more uniform doping profiles compared to diffusion processes. It also enables the doping of materials that are difficult to dope by diffusion. Additionally, ion implantation can be performed at lower temperatures, reducing the likelihood of damaging the material being processed.
Diffusion potential arises due to concentration differences of ions across a membrane without considering membrane permeability. Nernst potential, on the other hand, takes into account both concentration differences and membrane permeability for a specific ion to calculate the equilibrium potential at which the net flow of that ion is zero.
Facilitated diffusion, or diffusion through ion channels, is not a form of active transport. It is a spontaneous passive transport.
Ions are charged.
The ion biphosphate is (HPO4)2-.The ion pyrophosphate is (P2O7)4-.
gas ion transfer or diffusion through cells.
Sodium ions are larger and more hydrated than chloride ions, which slows down their diffusion rate through a medium. The presence of hydration shells around sodium ions leads to more friction and obstacles during diffusion, compared to the smaller and less hydrated chloride ions.
Facilitated diffusion and diffusion ion channels both involve the movement of substances down a concentration gradient without requiring energy input. However, facilitated diffusion involves the assistance of carrier proteins to transport specific molecules, while diffusion ion channels are specialized proteins that form pores in cell membranes for specific ions to pass through.
In ion implantation, a dimer refers to two atoms that are implanted simultaneously into a target material. This can be beneficial for certain applications where the presence of two atoms together can create specific interactions or properties in the material. Dimer implantation can be used to tailor the material's properties by controlling the concentration and distribution of the two types of atoms.
a sodium ion
passive