diffusion is high temperature process while ion implantation is low temperature process
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- centrifuging - gaseous diffusion - thermal diffusion - electromagnetic separation - expansion from nozzles - laser enrichment - ion exchangers - distillation
An n-type semiconductor is formed by doping a pure semiconductor (silicon or germanium, for example) with atoms of a Group V element, typically phosphorus or arsenic. The dopant may be introduced when the crystal is formed or later, by diffusion or ion implantation.
Annealing is the heat treatment given to a semiconductor material. Annealing is the process by which the lattice damages are repaired. The damages are generally done by ion implantation on semiconductor material.
An electric current goes through an electric circuit, if it is closed.
ions that plants need for supprt and growth