The familiar semi conducting materials are Silicon (Si) and Germanium (Ge)
These belong to fourth group as they have four valence electrons.
Now we need doping material whose valency may be either 5 (one more than 4) or trivalent (one less). By using one less ie trivalent material we can produce P type Si or P type Ge. Hence we add Boron, which is trivalent just as Aluminium along with Ge or Si.
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Boron is used as a doping element in semiconductors because it has one less electron than silicon, making it a p-type dopant. By introducing boron into silicon, it creates "holes" in the crystal structure which can carry positive charges, allowing for the creation of p-n junctions and the production of diodes and transistors.
Boron is used in numerous industrial applications, including in the production of glass, ceramics, and flame retardants. It is also used in semiconductors, nuclear reactors, and as a doping agent in materials for electronics. Additionally, boron is utilized in agriculture as a micronutrient for plant growth.
Boron is used in commercial applications such as borosilicate glass manufacturing, agriculture (as a fertilizer and soil amendment), and in the production of boron-containing ceramics and polymers. It is also employed in the semiconductor industry for doping silicon.
Element B is boron and is the fifth element in the periodic table with the symbol B. It is a metalloid that is commonly used in the production of ceramics and glass.
Boron is a stable element with two naturally occurring isotopes, boron-10 and boron-11. Boron-10 is present in about 20% abundance and is used in nuclear reactors and semiconductor technology.
Boron is commonly used in the production of ceramics, glass, and detergents. It is also utilized in the manufacturing of high-strength materials such as borosilicate glass and fiberglass. Boron is an important element in the semiconductor industry for doping in silicon-based devices.