The compound with the formula B2Cl4 is called boron tetrachloride. It is a colorless gas at room temperature and is used in the chemical industry as a catalyst and as a reagent in organic synthesis.
The chemical formula for carbon tetrachloride is CCl4. The chemical formula for calcium bromide is CaBr2.
The chemical formula for carbon tetrachloride is CCl4 and for calcium bromide is CaBr2.
The chemical formula for carbon tetrachloride is CCl4. The chemical formula for calcium bromide is CaBr2.
The compound with the formula SiC4 is silicon tetrachloride. It is a colorless, volatile liquid that is used in the production of silicon-containing compounds and as a precursor for silicon oxide films.
The empirical formula of silicon tetrachloride is SiCl4. This formula represents the simplest whole-number ratio of atoms of each element in the compound.
The compound for the formula SiCl4 is silicon tetrachloride.
The compound with the formula B2Cl4 is called boron tetrachloride. It is a colorless gas at room temperature and is used in the chemical industry as a catalyst and as a reagent in organic synthesis.
The molecular formula for silicon tetrachloride is SiCl4. It consists of one silicon atom bonded to four chlorine atoms. Silicon tetrachloride is commonly used in the electronics industry for producing silicon-based materials like computer chips.
It is called Silicon tetrachloride.
The chemical formula for carbon tetrachloride is CCl4. The chemical formula for calcium bromide is CaBr2.
The chemical formula of carbon tetrachloride is CCl4.
The chemical formula for carbon tetrachloride is CCl4 and for calcium bromide is CaBr2.
The chemical formula for carbon tetrachloride is CCl4 and the chemical formula for calcium bromide is CaBr2.
The chemical formula for carbon tetrachloride is CCl4. The chemical formula for calcium bromide is CaBr2.
CCl4 is the chemical formula for Carbon Tetrachloride.
The compound with the formula SiC4 is silicon tetrachloride. It is a colorless, volatile liquid that is used in the production of silicon-containing compounds and as a precursor for silicon oxide films.